Structure and growth of dotriacontane films on SiO2 and Ag(111) surfaces: Synchrotron X-ray scattering and molecular dynamics simulations

Physica Status Solidi (A) Applied Research

Volumn 201, Issue 10, 2004, Pages 2375-2380

  Mo, H ^a   Trogisch, S ^a   Taub, H ^a   Ehrlich, S N ^b   Volkmann, U G ^c   Hansen, F Y ^d   Pino, M ^c  

^a UNIVERSITY OF MISSOURI   (United States)

^b BROOKHAVEN NATIONAL LABORATORY   (United States)

^c PONTIFICIA UNIVERSIDAD CATÓLICA DE CHILE   (Chile)

^d TECHNICAL UNIVERSITY OF DENMARK   (Denmark)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; ELLIPSOMETRY; FILM GROWTH; LOW ENERGY ELECTRON DIFFRACTION; MOLECULAR STRUCTURE; MULTILAYERS; NUCLEATION; SILICA; SILVER; SYNCHROTRON RADIATION; X RAY SCATTERING;

DOTRIACONTANE FILMS; STRUCTURAL MODELS; X-RAY MEASUREMENTS;

MOLECULAR DYNAMICS;

EID: 4444243741     PISSN: 00318965     EISSN: None     Source Type: Journal    
DOI: 10.1002/pssa.200404894     Document Type: Conference Paper

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