Hierarchical optical proximity correction on contact hole layers

Digest of Papers - 2000 International Microprocesses and Nanotechnology Conference, MNC 2000

Volumn , Issue , 2000, Pages 40-41

  Yamamoto, Kazuko ^a   Kobayashi, Sachiko ^a   Uno, Taiga ^a   Kotani, Toshiya ^a   Tanaka, Satoshi ^a   Inoue, Soichi ^a   Watanabe, Susumu ^a   Higurashi, Hitoshi ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

NANOTECHNOLOGY; PATTERN MATCHING;

CONTACT HOLES; INPUT DATAS; LAYOUT DATA; OPTICAL PROXIMITY CORRECTIONS;

PHOTOLITHOGRAPHY;

EID: 4444234470     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/IMNC.2000.872612     Document Type: Conference Paper

References (3)

1. S. Miyama et al., Proc. SPIE vol 3679 (1999) pp. 614-617.
2. K. Koyama, et al., J. Vac. Sci. Technol. B, vol. 13 (1995) pp. 2508-2513.
3. T. Kotani, et al., Ext. Abstr. (The 47th Spring Meeting, 2000), The Japan Society of Applied Physics, to be published.