Fine pattern etching of silicon substrates using atmospheric line-shaped microplasma source

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 43, Issue 6 B, 2004, Pages 3959-3963

  Okumura, Tomohiro ^a   Saitoh, Mitsuo ^a   Matsuda, Izuru ^a  

^a PANASONIC CORPORATION   (Japan)

Author keywords

Atmospheric; Etching; Line; Microplasma; Oxidation; Silicon; Temperature

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; COMPUTER SIMULATION; ELECTRODES; MASKS; OXIDATION; PLASMA SOURCES; SILICON; SUBSTRATES;

GAS FEEDS; MICROPLASMA; SILICON WAFER DICING; SOLENOID ANTENNAS;

ETCHING;

EID: 4444224562     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.43.3959     Document Type: Conference Paper

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