Substrate preparation by magnetron sputtering and CVD growth of carbon nanotube arrays

ASME International Mechanical Engineering Congress and Exposition, Proceedings

Volumn 13, Issue , 2008, Pages 181-186

  Salunke, Pravahan ^a   Yarmolenko, Sergei ^b   Neralla, Sudhir ^b   Sankar, Jag ^b   Fischbach, Kyle ^a   Li, Ge ^a   Yun, Yeo Heung ^b   Schulz, Mark ^c   Shanov, Vesselin ^a  

^a UNIVERSITY OF CINCINNATI   (United States)

^b North Carolina Agricultural and Technical State University   (United States)

^c University of Cincinnati   (United States)

Author keywords

Carbon nanotube arrays; Chemical vapor deposition; Magnetron sputtering

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; CRYSTAL GROWTH; ELECTRON BEAMS; MAGNETRON SPUTTERING; SILICON WAFERS; TRANSMISSION ELECTRON MICROSCOPY; ALUMINA; CARBON; CATALYSTS; DEPOSITION; ELECTRON MICROSCOPY; FILM PREPARATION; GRAVIMETRIC ANALYSIS; MULTIWALLED CARBON NANOTUBES (MWCN); SCANNING ELECTRON MICROSCOPY; SUBSTRATES; THERMOGRAVIMETRIC ANALYSIS; X RAY DIFFRACTION; YARN;

CARBON NANOTUBE ARRAYS; CATALYST FILMS; SUBSTRATE PREPARATION; CARBON NANOTUBE ARRAY; INTERMEDIATE LAYERS; LARGE-AREA DEPOSITION; MULTI WALL CARBON NANOTUBE(MWCNT); OXIDIZED SI WAFERS; PROCESSING CONDITION; THERMAL GRAVIMETRIC ANALYSES (TGA);

CARBON NANOTUBES;

EID: 44349121740     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1115/IMECE2007-43190     Document Type: Conference Paper

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