Fabrication and characterization of ITO thin films on heat-resistant transparent flexible clay films

Surface and Coatings Technology

Volumn 202, Issue 13, 2008, Pages 2955-2959

  Tetsuka, Hiroyuki ^a   Ebina, Takeo ^a   Tsunoda, Tatsuo ^a   Nanjo, Hiroshi ^a   Mizukami, Fujio ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

81.05.Dz; Clay films; ITO thin films; rf sputtering; Transparent conducting

Indexed keywords

CLAY; ELECTRIC CONDUCTIVITY; HEAT RESISTANCE; MAGNETRON SPUTTERING; TRANSPARENCY;

CLAY FILM; INDIUM TIN OXIDE;

CONDUCTIVE FILMS;

CLAY; CONDUCTIVE FILMS; ELECTRIC CONDUCTIVITY; HEAT RESISTANCE; MAGNETRON SPUTTERING; TRANSPARENCY;

EID: 44249124537     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2007.10.039     Document Type: Article

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