Phase separation in poly(tert-butyl acrylate)/polyhedral oligomeric silsesquioxane (POSS) thin film blends

Langmuir

Volumn 24, Issue 9, 2008, Pages 5079-5090

  Paul, Rituparna ^a   Karabiyik, Ufuk ^a   Swift, Michael C ^a   Esker, Alan R ^a  

^a VIRGINIA POLYTECHNIC INSTITUTE AND STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING TEMPERATURE; POLYHEDRAL OLIGOMERIC SILSESQUIOXANE (POSS); REFLECTED LIGHT OPTICAL MICROSCOPY;

DECOMPOSITION; OLIGOMERS; PHASE SEPARATION; POLYSILANES; RAPID THERMAL ANNEALING; X RAY PHOTOELECTRON SPECTROSCOPY;

POLYMER BLENDS;

ACRYLIC ACID DERIVATIVE; ACRYLIC ACID TERT BUTYL ESTER; ORGANOSILICON DERIVATIVE; POLYMER; TERT-BUTYL ACRYLATE;

ARTICLE; ATOMIC FORCE MICROSCOPY; CHEMICAL STRUCTURE; CHEMISTRY; KINETICS; TEMPERATURE;

ACRYLATES; KINETICS; MICROSCOPY, ATOMIC FORCE; MOLECULAR STRUCTURE; ORGANOSILICON COMPOUNDS; POLYMERS; TEMPERATURE;

EID: 44249115627     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la702065z     Document Type: Article

References (111)