Evaluation of nanomechanical, nanotribological and adhesive properties of ultrathin polymer resist film by AFM

Microelectronic Engineering

Volumn 85, Issue 5-6, 2008, Pages 1189-1192

  Koszewski, Adam ^a   Rymuza, Zygmunt ^a   Reuther, Freimut ^b  

^a WARSAW UNIVERSITY OF TECHNOLOGY   (Poland)

^b MICRO RESIST TECHNOLOGY GMBH   (Germany)

Author keywords

Adhesion; AFM; Nanoimprint lithography; Nanomechanics; Nanotribology; Polymeric resist

Indexed keywords

ADHESION; ATOMIC FORCE MICROSCOPY; NANOIMPRINT LITHOGRAPHY; NANOMECHANICS; NANOTRIBOLOGY;

ADHESIVE PROPERTIES; POLYMERIC RESISTS; SPHERICAL TIPS;

POLYMER FILMS;

ADHESION; LITHOGRAPHY; MICROSCOPY; MONOLAYERS; POLYMERS;

EID: 44149120981     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2008.01.025     Document Type: Article

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