Atomistic simulation of CeO2 surface hydroxylation: Implications for glass polishing

Journal of Materials Science

Volumn 43, Issue 12, 2008, Pages 4157-4162

  Stanek, Christopher R ^a   Tan, Averyl H H ^b   Owens, Scott L ^c   Grimes, Robin W ^b  

^a LOS ALAMOS NATIONAL LABORATORY   (United States)

^b IMPERIAL COLLEGE LONDON   (United Kingdom)

^c NATIONAL NUCLEAR LABORATORY   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

DISSOCIATION; HYDROXYLATION; SURFACE TREATMENT; WATER ABSORPTION;

ATOMISTIC SIMULATION; GLASS POLISHING;

CERIUM COMPOUNDS;

EID: 43949097866     PISSN: 00222461     EISSN: 15734803     Source Type: Journal    
DOI: 10.1007/s10853-008-2605-2     Document Type: Article

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