Classification of defect clusters on semiconductor wafers via the hough transformation

IEEE Transactions on Semiconductor Manufacturing

Volumn 21, Issue 2, 2008, Pages 272-277

  White Jr , K Preston ^a,b   Kundu, Bijoy ^b   Mastrangelo, Christina M ^c  

^a IEEE

^b UNIVERSITY OF VIRGINIA   (United States)

^c UNIVERSITY OF WASHINGTON   (United States)

Author keywords

Defect metrology; Hough transformation; Image processing; Process control; Spatial defect analysis and classification; Wafer maps

Indexed keywords

CRYSTAL DEFECTS; IMAGE CLASSIFICATION; MATHEMATICAL TRANSFORMATIONS; PROCESS CONTROL;

DEFECT METROLOGY; HOUGH TRANSFORMATION; SPATIAL DEFECT ANALYSIS AND CLASSIFICATION; WAFER MAPS;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 43849110270     PISSN: 08946507     EISSN: None     Source Type: Journal    
DOI: 10.1109/TSM.2008.2000269     Document Type: Conference Paper

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