Source/drain extension region engineering in nanoscale double gate MOSFETs for low-voltage analog applications

Proceedings - IEEE International SOI Conference

Volumn , Issue , 2006, Pages 141-142

  Kranti, Abhinav ^a   Lim, Tao Chuan ^a   Alastair Armstrong, G ^a  

^a QUEEN'S UNIVERSITY BELFAST   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 43749124852     PISSN: 1078621X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/SOI.2006.284475     Document Type: Conference Paper

References (8)