-
3
-
-
0000158717
-
Interlaboratory study on the lithographically produced scanning electron microscope magnification standard prototype
-
Postek, M. T., Vladar, A. E., Jones, S. N. and Keery, W. J., "Interlaboratory study on the lithographically produced scanning electron microscope magnification standard prototype," Journal of Research of the National Institute of Standards and Technology, Vol. 98, No. 4, pp. 447-467, 1993.
-
(1993)
Journal of Research of the National Institute of Standards and Technology
, vol.98
, Issue.4
, pp. 447-467
-
-
Postek, M.T.1
Vladar, A.E.2
Jones, S.N.3
Keery, W.J.4
-
4
-
-
0000366291
-
Proposal for a new submicron dimension reference for an e-beam metrology system
-
Nakayama, Y., Okazaki S. and Sugimoto, A., "Proposal for a new submicron dimension reference for an e-beam metrology system," Journal of Vacuum Science and Technology B, Vol. 6, No. 6, pp. 1930-1933, 1988.
-
(1988)
Journal of Vacuum Science and Technology B
, vol.6
, Issue.6
, pp. 1930-1933
-
-
Nakayama, Y.1
Okazaki, S.2
Sugimoto, A.3
-
5
-
-
27844466880
-
High precision pitch calibration of gratings using laser diffractometry
-
Meli, F., Thalman, R. and Blattner, P., "High precision pitch calibration of gratings using laser diffractometry," First International Conference and General Meeting of the Euspen Society for Precision Engineering and Nanometrology, pp. 252-255, 1999.
-
(1999)
First International Conference and General Meeting of the Euspen Society for Precision Engineering and Nanometrology
, pp. 252-255
-
-
Meli, F.1
Thalman, R.2
Blattner, P.3
-
6
-
-
43449124281
-
Measurement of grating pitch standards using optical diffractometry and uncertainty analysis
-
Kim, J. A., Kim, J. W., Park, B. C., Kang, C. S. and Eom, T. B., Measurement of grating pitch standards using optical diffractometry and uncertainty analysis," Journal of the Korean Society for Precision Engineering, Vol. 23, No. 8, pp. 72-79, 2004.
-
(2004)
Journal of the Korean Society for Precision Engineering
, vol.23
, Issue.8
, pp. 72-79
-
-
Kim, J.A.1
Kim, J.W.2
Park, B.C.3
Kang, C.S.4
Eom, T.B.5
-
7
-
-
0032118306
-
Long-range AFM profiler used for accurate pitch measurements
-
Meli, F. and Thalmann, R., "Long-range AFM profiler used for accurate pitch measurements," Measurement Science and Technology, Vol. 9, No. 7, pp. 1087-1092, 1998.
-
(1998)
Measurement Science and Technology
, vol.9
, Issue.7
, pp. 1087-1092
-
-
Meli, F.1
Thalmann, R.2
-
8
-
-
0037390706
-
Uncertainty in pitch measurements of one-dimensional grating standards using a nanometrological atomic force microscope
-
Misumi,, I., Gonda, S., Kurosawa, T. and Takamasu, K., "Uncertainty in pitch measurements of one-dimensional grating standards using a nanometrological atomic force microscope," Measurement Science and Technology, Vol. 14, No. 4, pp. 463-471, 2003.
-
(2003)
Measurement Science and Technology
, vol.14
, Issue.4
, pp. 463-471
-
-
Misumi, I.1
Gonda, S.2
Kurosawa, T.3
Takamasu, K.4
-
9
-
-
43449139865
-
Development of a metrological atomic force microscope for the length measurements of nanometer range
-
Kim, J. A., Kim, J. W., Park, B. C., Eom, T. B. and Hong, J. W., "Development of a metrological atomic force microscope for the length measurements of nanometer range," Journal of the Korean Society for Precision Engineering, Vol. 21, No. 11, pp. 75-82, 2004.
-
(2004)
Journal of the Korean Society for Precision Engineering
, vol.21
, Issue.11
, pp. 75-82
-
-
Kim, J.A.1
Kim, J.W.2
Park, B.C.3
Eom, T.B.4
Hong, J.W.5
-
10
-
-
85013955779
-
Pitch measurement of one-dimensional gratings using a metrological atomic force microscope and uncertainty evaluation
-
Kim, J. A., Kim, J. W., Park, B. C., Eom, T. B. and Kang, C. S., "Pitch measurement of one-dimensional gratings using a metrological atomic force microscope and uncertainty evaluation," Journal of the Korean Society for Precision Engineermig, Vol. 22, No. 4, pp. 84-91, 2005.
-
(2005)
Journal of the Korean Society for Precision Engineermig
, vol.22
, Issue.4
, pp. 84-91
-
-
Kim, J.A.1
Kim, J.W.2
Park, B.C.3
Eom, T.B.4
Kang, C.S.5
-
11
-
-
0003492094
-
-
and OIML, ISO
-
BIPM, IEC, IFCC, ISO, IUPAC, IUPAP and OIML, "Guide to the Expression of Uncertainty in Measurement," ISO, 1993.
-
(1993)
Guide to the Expression of Uncertainty in Measurement
-
-
BIPM, I.1
IFCC, I.2
IUPAC, I.3
|