Infinite-layer (Ca,Sr)CuO2 films grown by MOCVD: Surface morphology and structural studies

Physica C: Superconductivity and its Applications

Volumn 408-410, Issue 1-4, 2004, Pages 904-905

  Endo, Kazuhiro ^a   Badica, Petre ^b  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b NATIONAL INSTITUTE OF MATERIALS PHYSICS   (Romania)

Author keywords

Josephson junction; MOCVD; Morphology; Roughness; SrxCa1 xCuO2 thin films

Indexed keywords

ELECTRICAL RESISTANCE; INFINITE-LAYERS; RECTANGULAR GRAINS; SMALL GRAINS; STACKED LAYERS;

CALCIUM COMPOUNDS; CONCENTRATION (PROCESS); ELECTRIC INSULATORS; ELECTRONIC EQUIPMENT; FILM GROWTH; INDUCTIVELY COUPLED PLASMA; JOSEPHSON JUNCTION DEVICES; METALLORGANIC CHEMICAL VAPOR DEPOSITION; SPECTROSCOPIC ANALYSIS; SUBSTRATES; SURFACE ROUGHNESS; SURFACES;

THIN FILMS;

EID: 4344699815     PISSN: 09214534     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.physc.2004.03.156     Document Type: Conference Paper

References (2)

1. Endo K., Yamasaki H., Misawa S., Yoshida S., Kajimura K. Nature. 355:1992;327.
2. Endo K., Badica P., Itoh J. Physica C. 386:2003;318.