Ferroelectric relaxor thin films grown by pulsed laser deposition

Ferroelectrics

Volumn 293, Issue , 2003, Pages 189-199

  Verardi, P ^a   Craciun, F ^a   Scarisoreanu, N ^b   Dinescu, M ^b   Grigoriu, C ^b   Galassi, C ^c   Costa, A L ^c  

^a CNR   (Italy)

^b NATIONAL INSTITUTE FOR LASER   (Romania)

^c INSTITUTE OF SCIENCE AND TECHNOLOGY FOR CERAMICS   (Italy)

Author keywords

Ferroelectric relaxor; Pulsed Laser Deposition; Thin films

Indexed keywords

CRYSTALLIZATION; ELECTRODEPOSITION; FILM GROWTH; LASER ABLATION; PERMITTIVITY; PULSED LASER DEPOSITION; X RAY DIFFRACTION;

DEPOSITION PARAMETERS; FERROELECTRIC HYSTERESIS MEASUREMENTS; FERROELECTRIC RELAXOR;

FERROELECTRIC THIN FILMS;

EID: 4344689386     PISSN: 00150193     EISSN: 15635112     Source Type: Journal    
DOI: 10.1080/00150190390238397     Document Type: Conference Paper

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