The effect of oxygen rf discharge on pulsed laser deposition of oxide films

Applied Physics A: Materials Science and Processing

Volumn 79, Issue 4-6, 2004, Pages 1405-1407

  De Giacomo, A ^a   De Pascale, O ^b  

^a Dipartment of Chemistry of Bari   (Italy)

^b CNR   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; ELECTRODES; EXCIMER LASERS; LASER BEAMS; MONOCHROMATORS; MORPHOLOGY; OPTICAL MICROSCOPY; REFRACTIVE INDEX; SCANNING ELECTRON MICROSCOPY; STOICHIOMETRY; THIN FILMS; TITANIUM OXIDES;

OXIDE FILMS; RADIO FREQUENCY (RF) DISCHARGES; SURFACE ACTIVATION; THIN FILM DEPOSITION;

PULSED LASER DEPOSITION;

EID: 4344685949     PISSN: 09478396     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00339-004-2794-8     Document Type: Conference Paper

References (7)

1. D.B. Chrisey, G.K. Huber, Pulsed Laser Deposition of Thin Films (Wiley, NY 1987)
2. P.R. Wilmott, J.R. Huber: Rev. Mod. Phys. 72, 315 (2000)
3. H.O. Sankur, W. Gunning: Appl. Opt. 28, 2806 (1989)
4. H.S. Kwok, H.S. Kim, S. Witanachchi, E. Petrou, J.P. Zheng, S. Patel, E. Narumi, D.T. Shaw: Appl. Phys. Lett. 59, 3643 (1991)
5. J. Krishnaswamy, A. Rengan, J. Narayan, K. Vedam, C.J. McHargue: Appl. Phys. Lett. 54, 2455 (1989)
6. A. De Giacomo, V.A. Shakhatov, G.S. Senesi, O. De Pascale, F. Prudenzano: Appl. Surf. Sci. 186, 533 (2002)
7. A. De Giacomo, V.A. Shakhatov, G.S. Senesi, S. Orlando: Spectrochim. Acta Part B 56, 1459 (2001)