Dependence of CH3OH oxidation activity for a wide range of PtRu alloys detailed analysis and new views

Journal of the Electrochemical Society

Volumn 151, Issue 8, 2004, Pages

  Bock, C ^a   MacDougall, B ^a   LePage, Y ^a  

^a NATIONAL RESEARCH COUNCIL CANADA   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

ARC-MELTING; ATOMIC LEVEL INFLUENCES; BULK ALLOYS; ELECTROCATALYSIS; OXIDATION REACTIONS;

ADSORPTION; CATALYSTS; CATHODES; CHEMICAL REACTIONS; COMPOSITION; CURRENT DENSITY; DEHYDROGENATION; DEPOSITION; ELECTRODES; MATHEMATICAL MODELS; MELTING; OXIDATION; PARAMETER ESTIMATION; RUTHENIUM; SEGREGATION (METALLOGRAPHY); SURFACE STRUCTURE;

PLATINUM ALLOYS;

EID: 4344681341     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1768545     Document Type: Article

References (24)

1. J. O'M. Bockris and H. Wroblowa, J. Electroanal. Chem. Interfacial Electrochem., 7, 428 (1964).
2. M. Watanabe and S. Motoo, J. Electroanal. Chem. Interfacial Electrochem., 60, 267 (1975).
3. H. A. Gasteiger, N. Markovic, P. N. Ross, and E. J. Cairns, J. Electrochem. Soc., 147, 1795 (1994).
4. A. Kabbabi, R. Faure, R. Durand, B. Beden, F. Hahn, J.-M. Leger, and C. Lamy, J. Electroanal. Chem., 444, 41 (1998).
5. T. Iwasita, H. Hoster, A. John-Anacker, W. F. Lin, and W. Vielstich, Langmuir, 16, 522 (2000).
6. D. Chu and S. Gilman, J. Electrochem. Soc., 143, 1685 (1996).
7. H. A. Gasteiger, N. Markovic, P. N. Ross, and E. J. Cairns, Jr., J. Phys. Chem., 98, 617 (1994).
8. S. F. Huang, Y. Chi, C. S. Lin, A. J. Carty, K. Mast, C. Bock, B. MacDougall, S. M. Peng, and G. H. Lee, Chem. Vap. Deposition, 9, 151 (2003).
9. B. Gurau, R. Viswanathan, R. Liu, T. J. Lafrenz, K. L. Ley, E. S. Smotkin, E. Reddington, A. Sapienza, B. C. Chan, T. E. Mallouk, and S. Sarangapani, J. Phys. Chem. B, 102, 9997 (1998).
10. A. J. Bard and L. R. Faulkner, Electrochemical Methods, Fundamentals and Applications, John Wiley & Sons, Inc., New York (1980).
11. X-Ray diffraction database, Diffraction Management System for Windows NT, Scintag, Inc., Cupertino, CA (1997).
12. B. E. Warren, X-Ray Diffraction, Dover Publications, New York (1990).
13. Y. Le Page, Unpublished results.
14. M. T. M. Koper, T. E. Shubina, and R. A. van Santen, J. Phys. Chem. B, 106, 686 (2002).
15. Q. Ge, S. Desai, M. Neurock, and K. Kourtakis, J. Phys. Chem. B, 105, 9533 (2001).
16. E. Antolini, L. Giorgi, F. Cardellini, and E. Passalacqua, J. Solid State Electrochem., 5, 131(2001).
17. G. M. Bancroft, I. Adams, L. L. Coatsworth, C. D. Bennewitz, J. D. Brown, and W. D. Westwood, Anal Chem., 47, 586 (1975).
18. C. D. Wagner, Handbook of X-Ray Photoelectron Spectroscopy, Perkin-Elmer Corporation, Physical Electronics Division, Eden Prairie, MN (1979).
19. A. S. Arico, P. Creti, P. L. Antonucci, J. Cho, H. Kim, and V. Antonucci, Electrochim. Acta, 43, 3719 (1998).
20. H. N. Dinh, X. Ren, F. H. Garzon, P. Zelenay, and S. Gottesfeld, J. Electroanal. Chem., 491, 222 (2000).
21. C. Bock and B. MacDougall, J. Electrochem. Soc., 150, E377 (2003).
22. P. Ross, in Electrocatalysis, J. Lipkoswki and P. R. Ross, Editors, Wiley-VCH, Inc., New York (1998).
23. E. Gileadi, Electrode Kinetics for Chemists, Chemical Engineers, and Material Scientists, VCH Publishers, Inc., New York (1993).
24. H. Kuchling, Physik, Formeln und Gesetze, Buch- and Zeit- Verlagsgesellschaft mbH Koeln (1982).