AFM studies of poly (5-amino-1-naphthol) ultrathin films obtained by associating Langmuir-Schaefer and Langmuir-Blodgett methods

Synthetic Metals

Volumn 145, Issue 2-3, 2004, Pages 147-151

  Rubinger, C P L ^a   Moreira, R L ^a   Neves, B R A ^a   Cury, L A ^a   Ferreira, C A ^b   Meneguzzi, A ^b  

^a FEDERAL UNIVERSITY OF MINAS GERAIS   (Brazil)

^b FEDERAL UNIVERSITY OF RIO GRANDE DO SUL   (Brazil)

Author keywords

Adhesion; Atomic force microscopy; Conjugated polymers; Langmuir Blodgett; Langmuir Schaefer; Poly(amino naphthol)

Indexed keywords

ADHESION; ALCOHOLS; ATOMIC FORCE MICROSCOPY; ELASTICITY; ELECTROCHEMISTRY; ELECTROPOLYMERIZATION; MONOLAYERS; MONOMERS; OXIDATION; PLASTIC FILMS; SILICON; STABILIZATION; ULTRATHIN FILMS;

LANGMUIR-BLODGETT; LANGMUIR-SCHAEFER; MOLECULAR ELECTRONICS; POLY(AMIO-NAOHTHOL);

ORGANIC POLYMERS;

EID: 4344679379     PISSN: 03796779     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.synthmet.2004.04.023     Document Type: Article

References (25)

1. Ohsaka T., Ohba M., Sato M., Oyama N., Tanaka S., Nakamura S. J. Electroanal. Chem. 300:1991;51.
2. Pham M.-C., Mostefai M., Simon M., Lacaze P.-C. Synth. Met. 63:1994;7.
3. Mostefai M., Pham M.-C., Marsaut J.-P., Aubard J., Lacaze P.-C. J. Electrochem. Soc. 143:1996;2116.
4. Meneguzzi A., Ferreira C.A., Pham M.-C., Delamar M., Lacaze P.-C. Eletrochim. Acta. 44:1999;2149.
5. Lu W.K., Elsenbaumer R.L., Wessling B. Synth. Met. 71:1995;2163.
6. Camalet J.L., Lacroix J.C., Aeiyach S., Chane-Ching K., Lacaze P.C. J. Electroanal. Chem. 416:1996;179.
7. Arias A.C., Hümmelgen I.A., Meneguzzi A., Ferreira C.A. Adv. Mater. 9:1997;972.
8. G. Roberts, Langmuir-Blodgett Films, Plenum Press, New York, 1990.
9. M.C. Petty, Langmuir-Blodgett Films - An Introduction, Cambridge University Press, Cambridge, 1996.
10. Cheung J.H., Rubner M.F. Thin Solid Films. 244:1994;990.
11. Feast W.J., Tsibouklis J., Pouwer K.L., Groenendaal L., Meijer E.W. Polymer. 37:1996;5017.
12. Bjornholm T., Hassenkam T., Reitzel N. J. Mater. Chem. 9:1999;1975.
13. Ravaine S., Mingotaud C., Delhaès P. Thin Solid Films. 284/285:1996;76.
14. C.P.L. Rubinger, R.L. Moreira, L.A. Cury, A. Jorio, G.N. Fontes, B.R.A. Neves, C.A. Ferreira, A. Meneguzzi, in press.
15. Troitsky V.I., Berzina T.S., Fontana M.P. Colloid Surf. A. 198:2002;689.
16. Cheung J.H., Rubner M.F. Thin Solid Films. 244:1994;990.
17. Dhanabalan A., Dabke R.B., Prasanth Kumar N., Talvar S.S., Major S., Lal R., Contractor A.Q. Langmuir. 13:1997;4395.
18. Dhanabalan A., Dabke R.B., Datta S.N., Prasanth Kumar N., Major S.S., Talwar S.S., Contractor A.Q. Thin Solid Films. 295:1997;255.
19. Porter T.L., Thomson D., Bradley M. Thin Solid Films. 288:1996;268.
20. Riul A. Jr., Mattoso L.H.C., Telles G.D., Herrmann P.S.P., Colnago L.A., Parizotto N.A., Baranauskas V., Faria R.M., Oliveira O.N. Jr. Thin Solid Films. 284:1996;177.
21. Matthewson M.J. Appl. Phys. Lett. 49:1986;1426.
22. Ritter J.E., Lardner T.J., Rosenfeld L., Lin M.R. J. Appl. Phys. 66:1989;3626.
23. Lu Y., Shinozaki D.M. J. Mat. Sci. 37:2002;1283.
24. Ebrahimi F., Kalwani L. Mat. Sci. Eng. A298:1999;116.
25. Li M., Carter C.B., Hillmyer M.A., Gerberich W.W. J. Mat. Res. 16:2001;3378.