Study of nanocrystalline diamond film growth in rf hybrid laser deposition systems in O2, H2 and H2 + Ar ambients

Applied Physics A: Materials Science and Processing

Volumn 79, Issue 4-6, 2004, Pages 1267-1270

  Novotny M ^a   Jelinek M ^a   Bulir J ^a   Lancok J ^a   Vorlicek V ^a   Bonarski, J ^b  

^a INSTITUTE OF PHYSICS   (Czech Republic)

^b INSTITUTE OF METALLURGY AND MATERIALS SCIENCE   (Poland)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; EXCIMER LASERS; FILM GROWTH; NANOSTRUCTURED MATERIALS; PROFILOMETRY; PULSED LASER DEPOSITION; RADIO FREQUENCY AMPLIFIERS; RAMAN SPECTROSCOPY; SAPPHIRE; SILICON; THICKNESS MEASUREMENT; X RAY DIFFRACTION ANALYSIS;

CARBON ATOMS; HYBRID PULSED LASER DEPOSITION (HPLD); NONCRYSTALLINE DIAMONDS (NCD);

DIAMOND FILMS;

EID: 4344661808     PISSN: 09478396     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00339-004-2733-8     Document Type: Conference Paper

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