Evaluating the eye fatigue problem in wafer inspection

IEEE Transactions on Semiconductor Manufacturing

Volumn 17, Issue 3, 2004, Pages 444-447

  Wang, Mao Jiun J ^a   Huang, Chung Lun ^a  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

After etching inspection (AEI); Eye fatigue; Inspection performance; Semiconductor manufacturing; Visual search; Wafer defects

Indexed keywords

ETCHING; IMAGE PROCESSING; INTEGRATED CIRCUIT MANUFACTURE; INTEGRATED CIRCUITS; LIQUID CRYSTAL DISPLAYS; PHOTORESISTORS; PROCESS CONTROL; STRAIN;

AFTER ETCHING INSPECTION (AEI); EYE FATIGUE; INSPECTION PERFORMANCE; SEMICONDUCTOR MANUFACTURING; VISUAL SEARCH; WAFER DEFECTS;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 4344661345     PISSN: 08946507     EISSN: None     Source Type: Journal    
DOI: 10.1109/TSM.2004.831943     Document Type: Conference Paper

References (2)

1. I. Soderberg, B. Calissendorff, S. Elofsson, B. Knave, and K. G. Nyman, "Investigation of visual strain experienced by microscope operators at an electronics plant," Appl. Ergonomics, vol. 14, no. 4, pp. 297-305, 1983.
2. A. Kreczy, M. Kofler, and A. Gschwendtner, The Lancet, vol. 354, pp. 1701-1702, 1999.