300-mm full-factory simulations for 90- and 65-nm IC manufacturing

IEEE Transactions on Semiconductor Manufacturing

Volumn 17, Issue 3, 2004, Pages 292-298

  Pillai, Devadas D ^a   Bass, Edward L ^a   Dempsey, James C ^a   Yellig, Edward J ^a  

^a INTEL CORPORATION   (United States)

Author keywords

300 mm wafer manufacturing; Automated material handling systems (AMHS) simulation; Fabrication simulation; Full factory modeling; High mix; High volume manufacturing; Sensitivity analysis; Technology development

Indexed keywords

AUTOMATION; COMPUTER SIMULATION; CONTROL SYSTEMS; PLANNING; SENSITIVITY ANALYSIS; SYSTEMS ANALYSIS;

AUTOMATED MATERIAL HANDLING SYSTEMS (AMHS); FABRICATION SIMULATION; FULL-FACTORY MODELING; HIGH-VOLUME MANUFACTURING;

INTEGRATED CIRCUIT MANUFACTURE;

EID: 4344657271     PISSN: 08946507     EISSN: None     Source Type: Journal    
DOI: 10.1109/TSM.2004.831930     Document Type: Conference Paper

References (5)

1. D. Pillai, E. Bass, J. Dempsey, and E. Yellig, "300 mm full-factory simulations for 90 nm and 65 nm IC manufacturing," in Proc. Int. Symp. Semiconductor Manufacturing - ISSM, San Jose, CA, Oct. 2003.
2. B. Subramanian, C. Lockwood, and D. Pillai, "Equipment buffering strategy to maximize productivity," in Proc. Int. Symp. Semiconductor Manufacturing - ISSM, San Jose, CA, Oct. 2003.
3. E. Yellig, D. Fox, and P. Tag, "Maximizing value of factory automation: 300 mm fab capacity," in Proc. Int. Symp. Semiconductor Manufacturing - ISSM, Tokyo, Japan, Oct. 2002.
4. D. Pillai, "Operations management challenges for 300 mm production," in Keynote Speech at MASM 2002 - Modeling Analysis Semiconductor Manufacturing Conf., Phoenix, AZ, Apr. 2002.
5. B. Sohn, D. Pillai, and N. Acker, "300 mm factory design for operational effectiveness," in Proc. IEEE/ASMC Conf., Munich, Germany, Apr. 2000.