Use of reactive gases with broad-beam radio frequency ion sources for industrial applications

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 22, Issue 4, 2004, Pages 1493-1499

  Schneider, St ^a   Jolly, T W ^b   Kohlstedt, H ^a   Waser, R ^a  

^a FORSCHUNGSZENTRUM JÜLICH   (Germany)

^b OXFORD INSTRUMENTS PLASMA TECHNOLOGY   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

GASEOUS ELECTRIC CONFERENCE (GEC); HIDEN ENERGY-DISPERSIVE QUADRUPOLE MASS SPECTROMETERS; REACTIVE GASES; REACTIVE ION BEAM ETCHING (RIBE);

CAPACITANCE; CHLORINE; CLOSED LOOP CONTROL SYSTEMS; CURRENT DENSITY; ENERGY DISPERSIVE SPECTROSCOPY; INDUCTIVELY COUPLED PLASMA; INDUSTRIAL APPLICATIONS; ION BEAMS; IONIZATION; MASS SPECTROMETERS; OPTIMIZATION; OXYGEN; PARAMETER ESTIMATION; REACTIVE ION ETCHING;

ION SOURCES;

EID: 4344612788     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1692396     Document Type: Conference Paper

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