메뉴 건너뛰기




Volumn 51, Issue 7, 2004, Pages 1148-1155

On the ballistic transport in nanometer-scaled DG MOSFETs

Author keywords

[No Author keywords available]

Indexed keywords

BACKSCATTERING; COMPUTER SIMULATION; MONTE CARLO METHODS; MOS DEVICES; NANOTECHNOLOGY; SEMICONDUCTING SILICON; SEMICONDUCTOR DEVICE MODELS; SILICON ON INSULATOR TECHNOLOGY; SPECTRUM ANALYSIS;

EID: 4344599060     PISSN: 00189383     EISSN: None     Source Type: Journal    
DOI: 10.1109/TED.2004.829904     Document Type: Article
Times cited : (98)

References (15)
  • 2
    • 0000961949 scopus 로고    scopus 로고
    • Experimental study of nonstationary electron transport in sub-0.1 μm metal-oxide-silicon devices: Velocity overshoot and its degradation mechanism
    • T. Mizuno and R. Ohba, "Experimental study of nonstationary electron transport in sub-0.1 μm metal-oxide-silicon devices: Velocity overshoot and its degradation mechanism," J. Appl. Phys., vol. 82, pp. 5235-5240, 1997.
    • (1997) J. Appl. Phys. , vol.82 , pp. 5235-5240
    • Mizuno, T.1    Ohba, R.2
  • 3
    • 0024070809 scopus 로고
    • Monte Carlo simulation of submicrometer Si n-MOSFETs at 77 and 300 K
    • May
    • S.E. Laux and M. V. Fischetti, "Monte Carlo simulation of submicrometer Si n-MOSFETs at 77 and 300 K," IEEE Electron Device Lett., vol. 9, pp. 467-469, May 1988.
    • (1988) IEEE Electron Device Lett. , vol.9 , pp. 467-469
    • Laux, S.E.1    Fischetti, M.V.2
  • 4
    • 36449008742 scopus 로고
    • Ballistic metal-oxide-semiconductor field effect transistor
    • K. Natori, "Ballistic metal-oxide-semiconductor field effect transistor," J. Appl. Phys., vol. 76, pp. 4879-4890, 1994.
    • (1994) J. Appl. Phys. , vol.76 , pp. 4879-4890
    • Natori, K.1
  • 5
    • 2442484819 scopus 로고    scopus 로고
    • Effect of discrete impurities on electron transport in ultrashort MOSFET using 3-D Monte Cario simulation
    • May
    • P. Dollfus, A. Bournel, S. Galdin, S. Barraud, and P. Hesto, "Effect of discrete impurities on electron transport in ultrashort MOSFET using 3-D Monte Cario simulation," IEEE Trans. Electron Devices, vol. 49, pp. 749-756, May 2004.
    • (2004) IEEE Trans. Electron Devices , vol.49 , pp. 749-756
    • Dollfus, P.1    Bournel, A.2    Galdin, S.3    Barraud, S.4    Hesto, P.5
  • 6
    • 0036253371 scopus 로고    scopus 로고
    • Essential physics of carrier transport in nanoscale MOSFETs
    • Jan
    • M. Lundstrom and Z. Ren, "Essential physics of carrier transport in nanoscale MOSFETs," IEEE Trans. Electron Devices, vol. 49, pp. 133-141, Jan. 2002.
    • (2002) IEEE Trans. Electron Devices , vol.49 , pp. 133-141
    • Lundstrom, M.1    Ren, Z.2
  • 7
    • 0036839486 scopus 로고    scopus 로고
    • A numerical study of ballistic transport in a nanoscale MOSFET
    • J.-H. Rhew, Z. Ren, and M. S. Lundstrom, "A numerical study of ballistic transport in a nanoscale MOSFET," Solid State Electron., vol. 46, pp. 1899-1906, 2002.
    • (2002) Solid State Electron. , vol.46 , pp. 1899-1906
    • Rhew, J.-H.1    Ren, Z.2    Lundstrom, M.S.3
  • 8
    • 0043033158 scopus 로고    scopus 로고
    • Role of scattering in nanotransistors
    • Dec
    • A. Svizhenko and M. P. Anantram, "Role of scattering in nanotransistors," IEEE Trans. Electron Devices, vol. 50, pp. 1459-1466, Dec. 2003.
    • (2003) IEEE Trans. Electron Devices , vol.50 , pp. 1459-1466
    • Svizhenko, A.1    Anantram, M.P.2
  • 9
    • 4344632054 scopus 로고    scopus 로고
    • Velocity distribution of electrons along the channel of nanoscale MOS transistors
    • M. Mouis and S. Barraud, "Velocity distribution of electrons along the channel of nanoscale MOS transistors," in Proc. ESSDERC, 2003, pp. 147-150.
    • (2003) Proc. ESSDERC , pp. 147-150
    • Mouis, M.1    Barraud, S.2
  • 10
    • 0000853776 scopus 로고    scopus 로고
    • x heterostructures: Electron transport and field-effect transistor operation using Monte Carlo simulation
    • x heterostructures: Electron transport and field-effect transistor operation using Monte Carlo simulation," J. Appl. Phys., vol. 82, pp. 3911-3916, 1997.
    • (1997) J. Appl. Phys. , vol.82 , pp. 3911-3916
    • Dollfus, P.1
  • 12
    • 14344267408 scopus 로고
    • On the screening of impurity potential by conduction electrons
    • N. Takimoto, "On the screening of impurity potential by conduction electrons," J. Phys. Soc. Jpn., vol. 14, pp. 1142-1158, 1959.
    • (1959) J. Phys. Soc. Jpn. , vol.14 , pp. 1142-1158
    • Takimoto, N.1
  • 13
    • 0026817615 scopus 로고
    • A semi-empirical model of surface scattering for Monte Carlo simulation of silicon n-MOSFET
    • Mar
    • E. Sangiorgi and M. R. Pinto, "A semi-empirical model of surface scattering for Monte Carlo simulation of silicon n-MOSFET," IEEE Trans. Electron Devices, vol. 39, pp. 356-361, Mar. 1992.
    • (1992) IEEE Trans. Electron Devices , vol.39 , pp. 356-361
    • Sangiorgi, E.1    Pinto, M.R.2
  • 14
    • 84907523528 scopus 로고    scopus 로고
    • Fullband Monte Carlo device simulation of an 0.1 μm n-channel MOSFET in strained silicon material
    • S. Keith, F. M. Bufler, and B. Meinerzhagen, "Fullband Monte Carlo device simulation of an 0.1 μm n-channel MOSFET in strained silicon material," in Proc. ESSDERC, 1997, pp. 200-203.
    • (1997) Proc. ESSDERC , pp. 200-203
    • Keith, S.1    Bufler, F.M.2    Meinerzhagen, B.3
  • 15
    • 33044486909 scopus 로고    scopus 로고
    • Scaling the MOSFETs to the limit: A physicist's perspective
    • M.V. Fischetti, "Scaling the MOSFETs to the limit: A physicist's perspective," J. Comput. Electron., vol. 2, pp. 73-79, 2003.
    • (2003) J. Comput. Electron. , vol.2 , pp. 73-79
    • Fischetti, M.V.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.