Zirconium tungstate (ZrW2O8)-based micromachined negative thermal-expansion thin films

Journal of Microelectromechanical Systems

Volumn 13, Issue 4, 2004, Pages 688-695

  Sutton, Michael S ^a   Talghader, Joseph ^a  

^a IEEE   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLINE MATERIALS; DENSITY CONTROL (SPECIFIC GRAVITY); ELECTRON BEAMS; EVAPORATION; MICROMACHINING; SPUTTER DEPOSITION; STOICHIOMETRY; THERMAL EFFECTS; THERMAL EXPANSION; THIN FILMS;

ELECTRON BEAM EVAPORATION; NEGATIVE THERMAL EXPANSION; THERMAL FACTORS; THERMALLY SENSITIVE MECHANICAL DEVICES; ZIRCONIUM TUNGSTATE;

ZIRCONIUM COMPOUNDS;

EID: 4344573246     PISSN: 10577157     EISSN: None     Source Type: Journal    
DOI: 10.1109/JMEMS.2004.832191     Document Type: Article

References (26)

1. W. Liu and J. Talghader, "Thermally invariant dielectric coatings for micromirrors," Appl. Opt., vol. 41, pp. 3285-3293, 2002.
2. S. Sinha, J. Mansell, and R. Byer, "Deformable mirrors for high-power lasers," in Proc. SPIE, vol. 4493, 2002, pp. 55-63.
3. R. C. Wetherhold and J. Wang, "Tailoring thermal deformation by using layered beams," Composites Sci. Technol., vol. 53, no. 1, pp. 1-6, 1995.
4. F. Jansen, M. Machonkin, N. Palmieri, and D. Kuhman, "Thermal expansion and elastic properties of plasma-deposited amorphous silicon and silicon oxide films," Appl. Phys. Lett., vol. 50, no. 16, pp. 1059-1061, 1987.
5. A. W. Sleight, "Isotropic negative thermal expansion," Annu. Rev. Mater. Sci., vol. 28, pp. 29-43, 1998.
6. 3," J. Amer. Ceram. Soc., vol. 50, pp. 211-215, 1967.
7. 8," Science, vol. 272, pp. 90-92, 1996.
8. P. S. Bulson, The Stability of Flat Plates. New York: Elsevier, 1969.
9. 8," Chem. Mater., vol. 8, pp. 2809-2823, 1996.
10. 8," J. Solid State Chem., vol. 139, pp. 424-426, 1998.
11. A. W. Sleight, "Negative thermal expansion materials," Current Opin. Solid State Mater. Sci., vol. 3, pp. 128-131, 1998.
12. G. T. Kovacs, Micromachined Transducers Sourcebook. New York: McGraw-Hill, 1998, pp. 196-197.
13. H. Guckel, T. Randazzo, and D. W. Burns, "A simple technique for the determination of mechanical strain in thin films with applications to polysilicon," J. Appl. Phys., vol. 57, pp. 1671-1675, 1985.
14. L. Doolittle, "Algorithms for the rapid simulation of Rutherford backscattering spectra," Nucl. Instr. Methods in Phys. Res. Section B, vol. B9, no. 3, pp. 344-351, 1985.
15. L. Feldman and J. Mayer, Fundamentals of Surface and Thin Film Analysis. Englewood Cliffs, NJ: Prentice-Hall, 1986.
16. S. Timoshenko, "Analysis of bi-metal thermostats," J. Opt. Soc. Amer., vol. 11, pp. 233-255, 1925.
17. M. Vasudevan and W. Johnson, "On multimetal thermostats," Appl. Sci. Res. Sec. B, vol. 9, pp. 420-430, 1962.
18. J. Mencik, D. Munz, E. Quandt, and E. Weppelmann, "Determination of elastic modulus of thin layers using nanoindentation," J. Mater. Res., vol. 12, no. 9, pp. 2475-2484, 1997.
19. H. Gao, C. Chiu, and J. Lee, "Slightly curved or kinked cracks in anisotropic elastic solids," Int. J. Solids Structures, vol. 29, pp. 2471-2492, 1992.
20. E. Chason and T. M. Mayer, "Thin film and surface characterization by specular x-ray reflectivity," Critical Rev. Solid State Mater. Sci., vol. 22, no. 1, pp. 1-67, 1997.
21. B. Lengeler and M. Huppauff, "Surface analysis by means of reflection, fluorescence and diffuse scattering of hard x-ray," Fresenius' J. Analyt. Chem., vol. 346, pp. 155-161, 1993.
22. K. Stoev and K. Sakurai, "Recent theoretical models in grazing incidence x-ray reflectometry," The Rigaku J., vol. 14, no. 2, pp. 22-37, 1997.
23. L. Kiesewetter and J.-M. Zhang, "Determination of Young's moduli of micromechanical thin films using the resonance method," Sens. Actuators A, vol. 35, no. 2, pp. 153-159, 1992.
24. O. Tabata, K. Kawahata, S. Sugiyama, and I. Igarashi, "Mechanical property measurement of thin films using load-deflection of composite rectangular membranes," Sens. Actuators, vol. 20, pp. 135-141, 1989.
25. J. Jiang, H. Lindelov, L. Gerward, K. Stahl, J. Recio, P. Mori-Sanchez, S. Carlson, M. Mezouar, E. Dooryhee, A. Fitch, and D. Frost, "Compressibility and thermal expansion of cubic silicon nitride," Phys. Rev. B, vol. 65, no. 16, pp. 161 202/1-161 202/4, 2002.
26. J. Thurn and R. F. Cook, "Stress hysteresis during thermal cycling of plasma-enhanced chemical vapor deposited silicon oxide films," J. Appl. Phys., vol. 91, no. 4, pp. 1988-1992, 2002.