Effect of oxygen partial pressure on the optical and structural properties of Al doped ZnO thin films prepared by RF magnetron sputtering method

Journal of Korean Institute of Metals and Materials

Volumn 46, Issue 4, 2008, Pages 249-256

  Shin, Seung Wook ^a   Park, Hyeon Soo ^a   Moon, Jong Ha ^a   Kim, Tae Won ^b   Kim, Jin Hyeok ^a  

^a Chonnam National University   (South Korea)

^b Korea Institute of Industrial Technology   (South Korea)

Author keywords

AZO; Oxygen ratio; Sputtering; Thin film; Transparent conducting oxide (TCO)

Indexed keywords

EID: 43349083228     PISSN: 17388228     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (23)