Fast and accurate OPC for standard-cell layouts

Proceedings of the Asia and South Pacific Design Automation Conference, ASP-DAC

Volumn , Issue , 2007, Pages 7-12

  Pawlowski, David M ^a   Deng, Liang ^a   Wong, Martin D F ^a  

^a United States of America   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

90 NM TECHNOLOGY NODE; APPLIED (CO); DESIGN AUTOMATION CONFERENCE (DAC); EDGE FEATURES; EDGE PLACEMENT ERROR (EPE); FEATURE DIMENSIONS; FUTURE TECHNOLOGY; GA TE LENGTHS; MASK DATA; MODEL BASED (OPC); MODEL-BASED OPC (MB-OPC); NEIGHBORING CELLS; OPTICAL PROXIMITY CORRECTION (OPC); RADIUS OF INFLUENCE (ROI); RUN TIME; SOUTH PACIFIC; STANDARD CELLS;

COMPUTER AIDED DESIGN; DATA REDUCTION; DIGITAL INTEGRATED CIRCUITS; ELECTRIC BATTERIES; HUMAN COMPUTER INTERACTION; INDUSTRIAL ENGINEERING; MASKS; MECHANIZATION; PHOTOLITHOGRAPHY; STANDARDS;

CELLS;

EID: 43249111234     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ASPDAC.2007.357784     Document Type: Conference Paper

References (6)

1. P. Gupta, F.-L. Heng, and M. Lavin, "Merits of cellwise model-based OPC," in Design and Process Integration for Microelectronic Manufaturing II, Proc. SPIE 5379, pp. 182-189, 2004.
2. X. Wang, M. Pilloff, H. Tang, and C. Wu, "Exploiting hierarchical structure to enhance cell-based RET with localized OPC reconfiguration," in Design and Process Integration for Microelectronic Manufaturing III, Proc. SPIE 5756, pp. 361-367, 2005.
3. L. Capodieci, P. Gupta, A. B. Kahng, D. Sylvester, and J. Yang, "Toward a methodology for manufacturability-driven design rule exploration," in Proc. of the 41st conference on Design automation, pp. 311-316, 2004.
4. A. K. K. Wong, Resolution Enhancement Techniques in Optical Lithography. SPIE Press, 2001.
5. Mentor Graphics, Calibre Model-Based OPC Users Manual.
6. ITRS, "International technology roadmap for semiconductors 2004," tech. rep., 2004.