Intel design for manufacturing and evolution of design rules

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6925, Issue , 2008, Pages

  Webb, Clair ^a  

^a INTEL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

PITCH POLY PATTERNING; TRANSISTOR DENSITY;

COMPUTER AIDED DESIGN; FIELD EFFECT TRANSISTORS; OPTICAL ENGINEERING;

LITHOGRAPHY;

EID: 43249102203     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.772052     Document Type: Conference Paper

References (6)