Time- and spatially-resolved characterization of electrical discharge machining plasma

Plasma Sources Science and Technology

Volumn 17, Issue 2, 2008, Pages

  Descoeudres, A ^a,c   Hollenstein, Ch ^a   Walder G ^b   Demellayer, R ^b,d   Perez, R ^b  

^a EPFL   (Switzerland)

^b Charmilles Technologies SA   (Switzerland)

^c CERN   (Switzerland)

^d EIG HES   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

CARRIER CONCENTRATION; ELECTRIC DISCHARGE MACHINING; ELECTRODES; OPTICAL EMISSION SPECTROSCOPY; STARK EFFECT;

DIELECTRIC MOLECULES; INCANDESCENT LIQUID METALLICS; STARK BROADENING;

PLASMAS;

EID: 43149084119     PISSN: 09630252     EISSN: 13616595     Source Type: Journal    
DOI: 10.1088/0963-0252/17/2/024008     Document Type: Article

References (60)

1. Lazarenko B R 1943 About the Inversion of Metal Erosion and Methods to Fight Ravage of Electric Contacts (Moscow: WEI-Institut) (in Russian)
2. Kobayashi K 1995 Proc. 11th Int. Symp. for Electro Machining (ISEM-11) (Lausanne, Switzerland) p 29
3. Loettgen R 1998 Proc. 12th Int. Symp. for Electro Machining (ISEM-12) (Aachen, Germany) p 341
4. Ho K H and Newman S T 2003 Int. J. Mach. Tools Manuf. 43 1287
5. Ho K H, Newman S T, Rahimifard S and Allen R D 2004 Int. J. Mach. Tools Manuf. 44 1247
6. Lauwers B, Kruth J P, Liu W, Eeraerts W, Schacht B and Bleys P 2004 J. Mater. Process. Technol. 149 347
7. Tani T, Fukuzawa Y, Mohri N, Saito N and Okada M 2004 J. Mater. Process. Technol. 149 124
8. Takezawa H, Hamamatsu H, Mohri N and Saito N 2004 J. Mater. Process. Technol. 149 112
9. Fleischer J, Masuzawa T, Schmidt J and Knoll M 2004 J. Mater. Process. Technol. 149 246
10. Beltrami I, Joseph C, Clavel R, Bacher J-P and Bottinelli S 2004 J. Mater. Process. Technol. 149 263
11. Jospeh C 2005 PhD Dissertation Ecole Polytechnique Fédérale de Lausanne, Switzerland
12. Cusanelli G, Hessler-Wyser A, Bobard F, Demellayer R, Perez R and Flükiger R 2004 J. Mater. Process. Technol. 149 289
13. Klocke F, Lung D, Antonoglu G and Thomaidis D 2004 J. Mater. Process. Technol. 149 191
14. Das S, Klotz M and Klocke F 2003 J. Mater. Process. Technol. 142 434
15. Perez R, Rojas H, Wälder G and Flükiger R 2004 J. Mater. Process. Technol. 149 198
16. Schulze H-P, Herms R, Juhr H, Schätzing W and Wollenberg G 2004 J. Mater. Process. Technol. 149 316
17. Van Dijck F 1973 Physico-mathematical analysis of the electro discharge machining process PhD Dissertation Catholic University of Leuven, Belgium
18. DiBitonto D D, Eubank P T, Patel M R and Barrufet M A 1989 J. Appl. Phys. 66 4095
19. Patel M R, Barrufet M A, Eubank P T and DiBitonto D D 1989 J. Appl. Phys. 66 4104
20. Eubank P T, Patel M R, Barrufet M A and Bozkurt B 1993 J. Appl. Phys. 73 7900
21. Albinski K, Musiol K, Miernikiewicz A, Labuz S and Malota M 1996 Plasma Sources Sci. Technol. 5 736
22. Pillans B W, Evensen M H, Taylor H F and Eubank P T 2002 J. Appl. Phys. 91 1780
23. Cusanelli G 2004 PhD Dissertation Université de Genève, Switzerland
24. Berkowitz A E and Walter J L 1987 J. Mater. Res. 2 277
25. Carrey J, Radousky H B and Berkowitz A E 2004 J. Appl. Phys. 95 823
26. Raizer Y P 1991 Gas Discharge Physics (Berlin: Springer)
27. Barmann P, Kröll S and Sunesson A 1996 J. Phys. D: Appl. Phys. 29 1188
28. Beroual A, Zahn M, Badent A, Kist K, Schwabe A J, Yamashita H, Yamazawa K, Danikas M, Chadband W D and Torshin Y 1998 IEEE Electr. Insul. Mag. 14 6
29. Griem H R 1974 Spectral Line Broadening by Plasmas (New York: Academic)
30. Heading D J, Bennett G R, Wark J S and Lee R W 1995 Phys. Rev. Lett. 74 3616
31. Vitel Y, El Bezzari M, Gavrilova T V, Skowronek M, D'yachkov L G and Kurilenkov Y K 1996 Physica B 228 161
32. Gigosos M A and Cardenoso V 1996 J. Phys. B: At. Mol. Opt. Phys. 29 4795
33. Boeddeker S, Guenter S, Koenies A, Hitzschke L and Kunze H-J 1993 Phys. Rev. E 47 2785
34. Olchawa W 2002 J. Quant. Spectrosc. Radiat. Transfer 74 417
35. Flih S A, Oks E and Vitel Y 2003 J. Phys. B: At. Mol. Opt. Phys. 36 283
36. Guenter S and Koenies A 1997 Phys. Rev. E 55 907
37. Escarguel A, Oks E, Richou J and Volodko D 2000 Phys. Rev. E 62 2667
38. Griem H R 1997 Principles of Plasma Spectroscopy (Cambridge: Cambridge University Press)
39. Griem H R 1963 Phys. Rev. 131 1170
40. Frayssines P, Bonifaci N, Denat A and Lesaint O 2002 J. Phys. D: Appl. Phys. 35 369
41. Escarguel A, Ferhat B, Lesage A and Richou J 2000 J. Quant. Spectrosc. Radiat. Transfer 64 353
42. Revaz B, Witz G and Flükiger R 2005 J. Appl. Phys. 98 113305
43. Revaz B, Emery J, Witz G, Flükiger R, Perez R, Carron J and Rappaz M 2005 IEEE Trans. Plasma Sci. 33 1066
44. Fortov V E and Iakubov I T 1990 Physics of Nonideal Plasma (New York: Hemisphere)
45. Kobzev G A, Iakubov I T and Popovich M M 1995 Transport and Optical Properties of Nonideal Plasma (New York: Plenum)
46. Rompe R and Steenbeck M 1975 Progress in Plasmas and Gas Electronics vol 1 (Berlin: Akademie-Verlag)
47. Inglis D R and Teller E 1939 Astrophys. J. 90 439
48. Vidal C-R 1966 J. Quant. Spectrosc. Radiat. Transfer 6 461
49. Roussel K M and O'Connell R F 1975 Phys. Lett. 51 244
50. Kuhn H G 1962 Atomic Spectra (London: Longmans Green)
51. Cohn A, Bakshi P and Kalman G 1972 Phys. Rev. Lett. 29 324
52. Gallagher C C and Levine M A 1973 Phys. Rev. Lett. 30 897
53. Rutgers W R and Kalfsbeek H W 1975 Z. Naturf. 30 739
54. Zhuzhunashvili A I and Oks E A 1977 Sov. Phys.-JETP 46 1122
55. Finken K H, Buchwald R, Bertschinger G and Kunze H-J 1980 Phys. Rev. A 21 200
56. Gavrilenko V P and Oks E A 1983 Sov. J. Plasma Phys. 13 22
57. Kalman G and Bakshi P 1990 J. Quant. Spectrosc. Radiat. Transfer 44 1
58. Bakshi P and Kalman G 1990 J. Quant. Spectrosc. Radiat. Transfer 44 93
59. Oks E A, Boedekker S and Kunze H-J 1991 Phys. Rev. A 44 8338
60. Benilov M S and Marotta A 1995 J. Phys. D: Appl. Phys. 28 1869