Fabrication of near-field optical probes using advanced functional thin films for MEMS and NEMS applications

Materials Science and Engineering: B

Volumn 149, Issue 3, 2008, Pages 292-298

  Hyun, J S ^a   Moon, J S ^a   Park, J H ^a   Kim, J W ^a   Kim, Y D ^a   Boo, J H ^a  

^a Sungkyunkwan University   (South Korea)

Author keywords

MEMS NEMS; MERIE dry etching; NSOM + AFM cantilever; Si3N4 and SiO2 thin films

Indexed keywords

ATOMIC FORCE MICROSCOPY; DRY ETCHING; LOW PRESSURE CHEMICAL VAPOR DEPOSITION; MEMS; NEAR FIELD SCANNING OPTICAL MICROSCOPY; NEMS; SILICON NITRIDE;

CANTILEVERS; LIGHT RESONANCE TUNNELING PHENOMENON; OPTICAL PROBES; SUBWAVELENGTH;

THIN FILMS;

EID: 43049137356     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mseb.2007.10.009     Document Type: Article

References (24)