Surface analysis of nanoscale aluminium and silicon films made by electrodeposition in ionic liquids

Zeitschrift fur Physikalische Chemie

Volumn 222, Issue 4, 2008, Pages 671-686

  Bebensee, Fabian ^a   Borissenko, Natalia ^a   Frerichs, Martin ^a   Höfft, Oliver ^a   Maus Friedrichs, Wolfgang ^a   Zein El Abedin, Sherif ^a,b   Endres, Frank ^a  

^a CLAUSTHAL UNIVERSITY OF TECHNOLOGY   (Germany)

^b NATIONAL RESEARCH CENTRE   (Egypt)

Author keywords

Al; Electrodeposition; HRSEM; Ionic liquids; Nanoparticles; Si; XPS

Indexed keywords

ALUMINUM; CRYSTALLITE SIZE; DEPOSITS; ELECTRODEPOSITION; ELECTRODES; INERT GASES; IONIC LIQUIDS; NANOCRYSTALLINE MATERIALS; NANOCRYSTALS; NANOPARTICLES; POSITIVE IONS; SCANNING ELECTRON MICROSCOPY; SILICON; SURFACE ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

HIGH-RESOLUTION SCANNING ELECTRON MICROSCOPIES; HRSEM; METALLIC CORES; MICROSCOPIC STUDY; NANO METER RANGE; NANO-CRYSTALLINE FILMS; PURE MATERIALS; SILICON FILMS;

ALUMINUM METALLOGRAPHY;

EID: 43049112822     PISSN: 09429352     EISSN: None     Source Type: Journal    
DOI: 10.1524/zpch.2008.5315     Document Type: Article

References (38)