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Volumn 25, Issue 4, 2008, Pages 1333-1335
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Design and fabrication of polarization-independent micro-ring resonators
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Author keywords
[No Author keywords available]
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Indexed keywords
BEAM PROPAGATION METHOD;
FABRICATION;
POLARIZATION;
REACTIVE ION ETCHING;
SILICON ON INSULATOR TECHNOLOGY;
SILICON WAFERS;
DEEP ULTRAVIOLET LITHOGRAPHY;
EFFECTIVE REFRACTIVE INDEX;
FULL-VECTOR BEAM PROPAGATION METHODS;
MICRORING RESONATOR (MRR);
PHOTONIC WIRE WAVEGUIDES;
POLARIZATION INDEPENDENT;
POLARIZATION SENSITIVITY;
POLARIZATION STATE;
POLARIZATION-INSENSITIVE;
SILICON ON INSULATOR WAFERS;
REFRACTIVE INDEX;
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EID: 43049104681
PISSN: 0256307X
EISSN: 17413540
Source Type: Journal
DOI: 10.1088/0256-307X/25/4/046 Document Type: Article |
Times cited : (3)
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References (12)
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