Longwave plasmonics on doped silicon and suicides

Optics Express

Volumn 16, Issue 9, 2008, Pages 6507-6514

  Soref, Richard ^a   Peale, Robert E ^a   Buchwald, Walter ^a  

^a AIR FORCE RESEARCH LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CONCENTRATION (PROCESS); ION IMPLANTATION; MICROPROCESSOR CHIPS; OPTICAL LOSSES; SEMICONDUCTING SILICON;

CHIP SURFACES; DOPED SILICON; LONGWAVE PLASMONICS; SILICON CHIPS;

PLASMONS;

GOLD; SILICON; SILICON DERIVATIVE;

ARTICLE; CHEMISTRY; OPTICS;

GOLD; OPTICS; SILICON; SILICON COMPOUNDS;

EID: 43049083733     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.16.006507     Document Type: Article

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