In situ measurements of optical film parameters and plasma monitoring during reactive sputtering for advanced in-line process control

Thin Solid Films

Volumn 516, Issue 14, 2008, Pages 4541-4545

  Richter, U ^a   Hentsch, W ^b   Liepack, H ^b   Kruse, R ^c   Dittrich, R ^d  

^a SENTECH INSTRUMENTS GMBH   (Germany)

^b FHR Anlagenbau GmbH   (Germany)

^c STEAG AG   (Germany)

^d IfU GmbH   (Germany)

Author keywords

Ellipsometry; Inline; Reflectometry; Sputtering

Indexed keywords

ELLIPSOMETRY; MEASUREMENT THEORY; PARAMETER ESTIMATION; PROCESS CONTROL; SPUTTER DEPOSITION;

IN SITU MEASUREMENTS; PLASMA MONITORING; REFLECTOMETRY;

OPTICAL FILMS;

EID: 42949135969     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.05.094     Document Type: Article

References (2)

1. Wallendorf T., Marke S., May C., and Strümpfel J. Surf. Coat. Technol. 94 (2003) 222
2. Semiconductor Equipment and Materials International (SEMI). SEMI E141-0705. Guide for specification of Ellipsometer equipment for use in integrated metrology.