Influence of substrate on the pulsed laser deposition growth and microwave behaviour of KTa0.6Nb0.4O3 potassium tantalate niobate ferroelectric thin films

Thin Solid Films

Volumn 516, Issue 15, 2008, Pages 4882-4888

  Rousseau, A ^a   Laur, V ^b   Deputier S ^a   Bouquet, V ^a   Guilloux Viry, M ^a   Tanne G ^b   Laurent, P ^b   Huret, F ^b   Perrin, A ^a  

^a INSTITUT DES SCIENCES CHIMIQUES DE RENNES   (France)

^b UNIVERSITÉ DE BRETAGNE OCCIDENTALE   (France)

Author keywords

Ferroelectric properties; Potassium tantalate niobate; Pulsed laser deposition; Structural properties

Indexed keywords

FERROELECTRICITY; FILM GROWTH; MICROWAVE DEVICES; POTASSIUM COMPOUNDS; PULSED LASER DEPOSITION; RUTHERFORD BACKSCATTERING SPECTROSCOPY;

FILM GROWTH TEMPERATURE; POTASSIUM TANTALATE NIOBATE;

FERROELECTRIC THIN FILMS;

EID: 42949134847     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.09.029     Document Type: Article

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