Study of tungsten oxidation in O2 H2 N2 downstream plasma

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 26, Issue 3, 2008, Pages 360-364

  Xu, Songlin ^a   Diao, Li ^a  

^a MATTSON THERMAL PRODUCTS GMBH   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

PHOTORESIST STRIPPING; REDUCTION PROCESSES; TUNGSTEN OXIDATION;

HYDROGEN; MOLECULAR OXYGEN; NITROGEN; OXIDATION; PLASMA APPLICATIONS; PLASMA DEVICES; TEMPERATURE MEASUREMENT;

TUNGSTEN;

EID: 42949114970     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2897316     Document Type: Article

References (7)