Exchange bias and enhancement of the Néel temperature in thin NiF2 films

Physical Review B - Condensed Matter and Materials Physics

Volumn 69, Issue 21, 2004, Pages

  Shi, Hongtao ^a   Lederman, D ^a   O'Donovan, K V ^b,c,d   Borchers, J A ^c  

^a WEST VIRGINIA UNIVERSITY   (United States)

^b UNIVERSITY OF MARYLAND   (United States)

^c NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^d UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FERROMAGNETIC MATERIAL; NICKEL COMPLEX;

ARTICLE; COOLING; CRYSTAL; FILM; MEASUREMENT; MOLECULAR INTERACTION; NEUTRON DIFFRACTION; TEMPERATURE DEPENDENCE;

EID: 42749102201     PISSN: 01631829     EISSN: None     Source Type: Journal    
DOI: 10.1103/PhysRevB.69.214416     Document Type: Article

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