Influence of ZrO2 in HfO2 on reflectance of HfO2/SiO2 multilayer at 248 nm prepared by electron-beam evaporation

Applied Surface Science

Volumn 254, Issue 15, 2008, Pages 4864-4867

  Yuan, Jingmei ^a   Yuan, Lei ^a   He, Hongbo ^a   Yi, Kui ^a   Fan, Zhengxiu ^a   Shao, Jianda ^a  

^a SHANGHAI INSTITUTE OF OPTICS AND FINE MECHANICS   (China)

Author keywords

HfO2 SiO2 multilayer; Reflectance; ZrO2 impurity

Indexed keywords

ELECTRON BEAMS; EVAPORATION; HAFNIUM COMPOUNDS; MULTILAYERS; REFLECTION; REFRACTIVE INDEX;

ELECTRON-BEAM EVAPORATION; REFRACTIVE INDEX MATERIAL;

ZIRCONIUM COMPOUNDS;

EID: 42749093931     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2008.01.171     Document Type: Article

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