26Al tracer diffusion in titanium doped single crystalline α-Al2O3

Solid State Ionics

Volumn 179, Issue 11-12, 2008, Pages 373-379

  Fielitz, P ^a   Borchardt, G ^a   Ganschow, S ^b   Bertram, R ^b   Markwitz, A ^c  

^a CLAUSTHAL UNIVERSITY OF TECHNOLOGY   (Germany)

^b LEIBNIZ INSTITUTE FOR CRYSTAL GROWTH   (Germany)

^c GNS SCIENCE   (New Zealand)

Author keywords

26Al; Al2O3; Alumina; Aluminium diffusion; SIMS; Titanium doped

Indexed keywords

ALUMINA; DIFFUSION; ENTHALPY; SEMICONDUCTOR DOPING; TITANIUM;

ALUMINUM DIFFUSION; MIGRATION ENTHALPY; TRACER DIFFUSION; TRANSPORT MEASUREMENTS;

CRYSTALLINE MATERIALS;

EID: 42649117495     PISSN: 01672738     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ssi.2008.03.007     Document Type: Article

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