Amorphous and nanocrystalline p-i-n Si and Si,Ge photodetectors for structurally integrated O2 sensors

Journal of Non-Crystalline Solids

Volumn 354, Issue 19-25, 2008, Pages 2606-2609

  Ghosh, Debju ^a   Shinar, Ruth ^a   Dalal, Vikram ^a   Zhou, Zhaoqun ^b   Shinar, Joseph ^a,b  

^a Iowa State University of Science and Technology   (United States)

^b IOWA STATE UNIVERSITY   (United States)

Author keywords

Nanocrystalline; Plasma deposition; Sensors; Silicon

Indexed keywords

AMORPHOUS MATERIALS; BUFFER LAYERS; CHEMICAL SENSORS; NANOCRYSTALLINE MATERIALS; PHOTOLUMINESCENCE; PLASMA DEPOSITION; SILICON; SILICON CARBIDE;

ILLUMINATION WAVELENGTH; ORGANIC LIGHT EMITTING DEVICE (OLED) PIXELS; SUPERSTRATE STRUCTURE;

PHOTODETECTORS;

EID: 42649109731     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnoncrysol.2007.09.065     Document Type: Article

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