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Volumn 25, Issue 2, 2008, Pages 648-650
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Kinetics of nitrogen indiffusion in Czochralski silicon annealed in nitrogen ambient
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Author keywords
[No Author keywords available]
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Indexed keywords
ABSORPTION SPECTROSCOPY;
LIGHT ABSORPTION;
SILICON;
TEMPERATURE;
CZOCHRALSKI SILICON;
ELEVATED TEMPERATURE;
FLOAT ZONE SILICON;
FOURIER TRANSFORM INFRARED ABSORPTION SPECTROSCOPY;
LOWS-TEMPERATURES;
NITROGEN AMBIENT;
NITROGEN DIFFUSIVITY;
NITROGEN;
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EID: 42649101637
PISSN: 0256307X
EISSN: 17413540
Source Type: Journal
DOI: 10.1088/0256-307X/25/2/079 Document Type: Article |
Times cited : (2)
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References (13)
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