Obtaining a high area ratio free-standing silicon microchannel plate via a modified electrochemical procedure

Journal of Micromechanics and Microengineering

Volumn 18, Issue 3, 2008, Pages

  Chen, Xiaoming ^a   Lin, Jilei ^a   Yuan, Ding ^a   Ci, Pengliang ^a   Xin, Peisheng ^a   Xu, Shaohui ^a   Wang, Lianwei ^a,b  

^a EAST CHINA NORMAL UNIVERSITY   (China)

^b INSTITUTE OF GEOLOGY AND GEOPHYSICS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON MULTIPLICATION; SILICON MICROCHANNEL PLATE (SI MCP); WAFER THINNING;

ELECTROCHEMICAL ETCHING; ELECTROCHEMISTRY; LASER BEAMS; SILICON COMPOUNDS;

MICROCHANNELS;

EID: 42549165533     PISSN: 09601317     EISSN: 13616439     Source Type: Journal    
DOI: 10.1088/0960-1317/18/3/037003     Document Type: Article

References (10)