Influence of yttrium ion-implantation on the growth kinetics and micro-structure of NiO oxide film

Plasma Science and Technology

Volumn 10, Issue 1, 2008, Pages 43-45

  Jin, Huiming ^a   Felix, Adriana ^b   Aroyave, Majorri ^b  

^a YANGZHOU UNIVERSITY   (China)

^b National University of Antiuquia ^*  (Colombia)

Author keywords

Ion implantation; Laser Raman; Oxide; Stress; Yttrium

Indexed keywords

ION IMPLANTATION; MICROSTRUCTURE; NICKEL OXIDE; OXIDE FILMS; SCANNING ELECTRON MICROSCOPY; TRANSMISSION ELECTRON MICROSCOPY;

HIGH TEMPERATURE PLASTICITY; MICROMORPHOLOGY;

YTTRIUM;

EID: 42549122699     PISSN: 10090630     EISSN: None     Source Type: Journal    
DOI: 10.1088/1009-0630/10/1/09     Document Type: Article

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