Thermogravimetric evaluation of the suitability of precursors for MOCVD

Measurement Science and Technology

Volumn 19, Issue 2, 2008, Pages

  Kunte, G V ^a   Shivashankar, S A ^a   Umarji, A M ^a  

^a INDIAN INSTITUTE OF SCIENCE   (India)

Author keywords

Clausius Claypeyron equation; Langmuir equation; Metalorganic chemical vapour deposition (MOCVD); Precursor; Sublimation; Thermogravimetry; Vapour pressure

Indexed keywords

METALLORGANIC CHEMICAL VAPOR DEPOSITION; NUMERICAL METHODS; PRESSURE EFFECTS; SUBLIMATION; THERMOGRAVIMETRIC ANALYSIS;

CLAUSIUS-CLAYPEYRON EQUATION; LANGMUIR EQUATION; SUBLIMING COMPOUNDS;

VAPOR PRESSURE;

METALLORGANIC CHEMICAL VAPOR DEPOSITION; NUMERICAL METHODS; PRESSURE EFFECTS; SUBLIMATION; THERMOGRAVIMETRIC ANALYSIS; VAPOR PRESSURE;

EID: 42549094531     PISSN: 09570233     EISSN: 13616501     Source Type: Journal    
DOI: 10.1088/0957-0233/19/2/025704     Document Type: Article

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