Novel Cu/Cr/Ge/Pd ohmic contacts on highly doped n-GaAs

Journal of Electronic Materials

Volumn 37, Issue 6, 2008, Pages 901-904

  Sahoo, Kartika Chandra ^a   Chang, Chun Wei ^a   Wong, Yuen Yee ^a   Hsieh, Tung Ling ^a   Chang, Edward Yi ^a   Lee, Ching Ting ^b  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

^b NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

Author keywords

Annealing; Diffusion; Ohmic contact; Thermal stability

Indexed keywords

COPPER DIFFUSION; INTERFACIAL INSTABILITY; UNDERLYING LAYERS;

ANNEALING; AUGER ELECTRON SPECTROSCOPY; CHARACTERIZATION; CHROMIUM; CONTACT RESISTANCE; COPPER; DIFFUSION; DOPING (ADDITIVES); SEMICONDUCTING GALLIUM ARSENIDE; THERMODYNAMIC STABILITY; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION;

OHMIC CONTACTS;

EID: 42449142700     PISSN: 03615235     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11664-008-0398-3     Document Type: Article

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