Tantalum nitride thin film resistors by low temperature reactive sputtering for plastic electronics

Surface and Interface Analysis

Volumn 40, Issue 3-4, 2008, Pages 758-762

  Scandurra, Antonino ^a,e   Indelli, Giuseppe Francesco ^a,e   Pignataro, Bruno ^b,e   Di Marco, Silvestra ^c,e   Di Stefano, Maria Ausilia ^c,e   Ravesi, Sebastiano ^c,e   Pignataro, Salvatore ^a,d,e  

^a Laboratorio Superfici e Interfasi SUPERLAB   (Italy)

^b UNIVERSITY OF PALERMO   (Italy)

^c STMICROELECTRONICS   (Italy)

^d UNIVERSITY OF CATANIA   (Italy)

^e PLAST ICs   (Italy)

Author keywords

AFM; Plastic electronics; SIMS; Tantalum nitride; XPS

Indexed keywords

ATOMIC FORCE MICROSCOPY; RESISTORS; SHEET RESISTANCE; SPUTTERING; THIN FILM DEVICES; X RAY PHOTOELECTRON SPECTROSCOPY;

FILM COMPOSITIONS; PLASTIC ELECTRONICS; TANTALUM NITRIDE;

TANTALUM COMPOUNDS;

EID: 42449135451     PISSN: 01422421     EISSN: 10969918     Source Type: Journal    
DOI: 10.1002/sia.2681     Document Type: Conference Paper

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