Modeling of the carbon nanotube chemical vapor deposition process using methane and acetylene precursor gases

Nanotechnology

Volumn 19, Issue 16, 2008, Pages

  Lysaght, Andrew C ^a   Chiu, Wilson K S ^a  

^a UNIVERSITY OF CONNECTICUT   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACETYLENE; CHEMICAL VAPOR DEPOSITION; COMPUTATIONAL METHODS; MATHEMATICAL MODELS; METHANE; REACTION KINETICS;

CONCENTRATION PROFILES; FEED STREAMS;

CARBON NANOTUBES;

ACETYLENE; CARBON NANOTUBE; HYDROCARBON; HYDROGEN; IRON; METHANE; NANOPARTICLE;

ARTICLE; CALCULATION; CHEMICAL VAPOR DEPOSITION; ENERGY; GAS; HEATING; HORIZONTAL TUBE FLOW REACTOR; MASS; MATHEMATICAL ANALYSIS; MODEL; PRIORITY JOURNAL; REACTOR; STEADY STATE; TEMPERATURE SENSITIVITY; TUBE; VAPOR;

EID: 42449083358     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/19/16/165607     Document Type: Article

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