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Applied Physics A: Materials Science and Processing

Volumn 66, Issue SUPPL. 1, 1998, Pages

A new experimental setup for in situ characterization of diamond deposition by scanning tunneling microscopy

(2) Ackermann, L a Kulisch, W a

a UNIVERSITY OF KASSEL (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOUR DEPOSITION; DIAMOND DEPOSITION; DIAMOND GROWTH; DIAMOND SURFACES; DIAMOND THIN FILM; EXPERIMENTAL SETUP; FILAMENT TEMPERATURE; GAS FLOWS; HIGH PRESSURE; HIGH RESOLUTION; HOT-FILAMENT; HOT-FILAMENT REACTORS; IN-SITU CHARACTERIZATION; IN-SITU SCANNING TUNNELING MICROSCOPIES; LONG TERM STABILITY; PERFORMANCE TESTS; PROCESS CONDITION; SITU STM; TUNNELING MICROSCOPES;

DEPOSITION; DIAMOND DEPOSITS; DIAMONDS; FILAMENTS (LAMP); THIN FILMS; WIND TUNNELS;

SCANNING TUNNELING MICROSCOPY;

EID: 4244129360 PISSN: 09478396 EISSN: 14320630 Source Type: Journal
DOI: 10.1007/s003390051097 Document Type: Article

Times cited : (1)

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