XSW study of oxygen/alkali metal/Si(1 1 1) interfaces

Surface Science

Volumn 482-485, Issue PART 2, 2001, Pages 1283-1286

  Sanchez Hanke C ^a   Etelaniemi V ^b   Hille, A ^a   Materlik, G ^a   Michel, E G ^c  

^a DESY   (Germany)

^b UNIVERSITY OF HELSINKI   (Finland)

^c INSTITUTO NICOLÁS CABRERA   (Spain)

Author keywords

Alkali metals; Chemisorption; Metal semiconductor interfaces; Oxygen; Silicon; X ray standing waves

Indexed keywords

EID: 4244127252     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(01)00921-9     Document Type: Article

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