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Volumn 4, Issue 4, 1992, Pages 747-749
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Chemical Vapor Deposition of Thin Films of Ruthenium and Formation of an Unexpected Byproduct Using Hexafluoro-2-butynetetracarbonyl-ruthenium(0)
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Author keywords
[No Author keywords available]
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Indexed keywords
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EID: 4244018764
PISSN: 08974756
EISSN: 15205002
Source Type: Journal
DOI: 10.1021/cm00022a002 Document Type: Article |
Times cited : (19)
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References (14)
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