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Volumn 389-393, Issue 1, 2002, Pages 251-254
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Homoepitaxial 'Web growth' of SiC to terminate C-axis screw dislocations and enlarge step-free surfaces
a a b b a a a c c |
Author keywords
AFM; Cantilever; CVD; Homoepitaxial growth; Step free surfaces; SWBXT; Web growth
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Indexed keywords
ATOMIC FORCE MICROSCOPY;
CHEMICAL VAPOR DEPOSITION;
CRYSTAL STRUCTURE;
DISLOCATIONS (CRYSTALS);
SILICON CARBIDE;
CRYSTALLOGRAPHY;
MICROMETERS;
NANOCANTILEVERS;
SCREW DISLOCATIONS;
SCREWS;
HOMOEPITAXIAL GROWTH;
STEP-FREE SURFACES;
WEB GROWTH;
4H-SIC SUBSTRATE;
CANTILEVER;
ELECTRICAL DEVICES;
HOMOEPITAXIAL;
MESA SIDEWALL;
STEP-FREE SURFACE;
SWBXT;
EPITAXIAL GROWTH;
SILICON CARBIDE;
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EID: 4243840440
PISSN: 02555476
EISSN: 16629752
Source Type: Book Series
DOI: 10.4028/www.scientific.net/msf.389-393.251 Document Type: Article |
Times cited : (11)
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References (6)
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