The atomic structure of the Si(111) (2√3 × 2√3) R30°-Sn reconstruction

Applied Surface Science

Volumn 104-105, Issue , 1996, Pages 124-129

  Levermann, A H ^a,d   Howes, P B ^a   Edwards, K A ^a   Anyele, H T ^a   Matthai, C C ^a   Macdonald, J E ^a   Feidenhans'l, R ^b   Lottermoser, L ^c   Seehofer, L ^c   Falkenberg, G ^c   Johnson, R L ^c  

^a CARDIFF UNIVERSITY   (United Kingdom)

^b TECHNICAL UNIVERSITY OF DENMARK   (Denmark)

^c UNIVERSITY OF HAMBURG   (Germany)

^d UNIVERSITY OF STUTTGART   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; COATINGS; MATHEMATICAL MODELS; SURFACE STRUCTURE; TIN; X RAY DIFFRACTION;

SURFACE RECONSTRUCTION;

SEMICONDUCTING SILICON;

EID: 4243506709     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(96)00132-8     Document Type: Article

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