Quality of Fe3O4 films prepared by plasma assisted MOCVD

Journal De Physique. IV : JP

Volumn 7, Issue 1, 1997, Pages

  Kiyomura, T ^a   Gomi, M ^a  

^a JAPAN ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFUSION IN SOLIDS; FILM GROWTH; MAGNETIC FILMS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MORPHOLOGY; PLASMA APPLICATIONS; SCANNING ELECTRON MICROSCOPY; SILICON WAFERS; SUBSTRATES; SURFACE PROPERTIES; THERMAL EFFECTS; X RAY PHOTOELECTRON SPECTROSCOPY;

ACETYLACETONATE IRON COMPLEXES;

MAGNETITE;

EID: 4243485962     PISSN: 11554339     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1051/jp4:19971253     Document Type: Article

References (2)

1. H. Torii, E. Fujii and M. Hattori, "Preparation of Ferrite Films by Plasma Assisted MOCVD", The Sixth Int. Conf. on Ferrites, Tokyo 29 Sept.- 2 Oct 1992, T. Yamaguchi and M. Abe Eds. ( The Jpn. Soc. of Powder and Powder Metallurgy, Tokyo, 1992) pp. 464-467.
2. E.J. Donahue and D.M. Schleich, J. Appl. Phys. 71 (1992) 6013-6017.